Compressively Strained Epitaxial Ge Layers for Quantum Computing Applications

Yosuke Shimura

doi:https://doi.org/10.7567/SSDM.2023.F-5-04

講演情報

Oral Presentation

01: Advanced CMOS: Material Science / Process Engineering / Device Technology

[F-5] Advanced CMOS: Process Technology

2023年9月8日(金) 09:00 〜 10:15 Room F (224, Bldg. 2)

Session Chairs: Genji Nakamura (Tokyo Electron Ltd.), Takashi Matsukawa (AIST)

10:00 〜 10:15

[F-5-04] Compressively Strained Epitaxial Ge Layers for Quantum Computing Applications

^○Yosuke Shimura¹, Clement Godfrin¹, Andriy Hikavyy¹, Roy Li¹, Juan Aguilera Servin², Georgios Katsaros², Paola Favia¹, Danny Wan¹, Kristiaan De Greve¹, Roger Loo¹ (1. imec (Belgium), 2. IST Austria (Austria))

https://doi.org/10.7567/SSDM.2023.F-5-04

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講演情報

[F-5] Advanced CMOS: Process Technology

[F-5-04] Compressively Strained Epitaxial Ge Layers for Quantum Computing Applications

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