Device Characteristic Variability of GAA Si NS CFETs Induced by PVE and IPF

Sekhar Reddy Kola

doi:https://doi.org/10.7567/SSDM.2023.F-7-05

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Oral Presentation

01: Advanced CMOS: Material Science / Process Engineering / Device Technology

[F-7] Advanced CMOS: Device Technology 1

Fri. Sep 8, 2023 1:30 PM - 3:15 PM Room F (224, Bldg. 2)

Session Chairs: Anabela Veloso (imec), Seungkwon Kim (Samsung Electronics)

2:45 PM - 3:00 PM

[F-7-05 (Late News)] Device Characteristic Variability of GAA Si NS CFETs Induced by PVE and IPF

^○Sekhar Reddy Kola¹, Yiming Li¹ (1. National Yang Ming Chiao Tung University (Taiwan))

https://doi.org/10.7567/SSDM.2023.F-7-05

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Presentation information

[F-7] Advanced CMOS: Device Technology 1

[F-7-05 (Late News)] Device Characteristic Variability of GAA Si NS CFETs Induced by PVE and IPF

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