Device Characteristic Variability of GAA Si NS CFETs Induced by PVE and IPF

Sekhar Reddy Kola

doi:https://doi.org/10.7567/SSDM.2023.F-7-05

講演情報

Oral Presentation

01: Advanced CMOS: Material Science / Process Engineering / Device Technology

[F-7] Advanced CMOS: Device Technology 1

2023年9月8日(金) 13:30 〜 15:15 Room F (224, Bldg. 2)

Session Chairs: Anabela Veloso (imec), Seungkwon Kim (Samsung Electronics)

14:45 〜 15:00

[F-7-05 (Late News)] Device Characteristic Variability of GAA Si NS CFETs Induced by PVE and IPF

^○Sekhar Reddy Kola¹, Yiming Li¹ (1. National Yang Ming Chiao Tung University (Taiwan))

https://doi.org/10.7567/SSDM.2023.F-7-05

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講演情報

[F-7] Advanced CMOS: Device Technology 1

[F-7-05 (Late News)] Device Characteristic Variability of GAA Si NS CFETs Induced by PVE and IPF

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