Robustness of ferroelectric domain walls in Hf0.5Zr0.5O2 thin films investigated by ac-signal response of dielectric properties

Shinji Migita

講演情報

Short Oral Presentation

01: Advanced CMOS: Material Science / Process Engineering / Device Technology

[SO-PS-01] 01: Advanced CMOS: Material Science / Process Engineering / Device Technology

2023年9月7日(木) 13:30 〜 14:00 Room F (224, Bldg. 2)

Session Chairs: Hidetoshi Oishi (Sony Semiconductor Solutions Corp.), Keisuke Yamamoto (Kyushu Univ)

13:42 〜 13:44

[SO-PS-01-07] Robustness of ferroelectric domain walls in Hf_0.5Zr_0.5O₂ thin films investigated by ac-signal response of dielectric properties

^○Shinji Migita¹, Shutaro Asanuma¹, Yukinori Morita¹, Hiroyuki Ota¹ (1. AIST (Japan))

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講演情報

[SO-PS-01] 01: Advanced CMOS: Material Science / Process Engineering / Device Technology

[SO-PS-01-07] Robustness of ferroelectric domain walls in Hf0.5Zr0.5O2 thin films investigated by ac-signal response of dielectric properties

パスワード

[SO-PS-01-07] Robustness of ferroelectric domain walls in Hf_0.5Zr_0.5O₂ thin films investigated by ac-signal response of dielectric properties