International Display Workshops General Incorporated Association

Proceedings of the International Display Workshops Volume 26 (IDW '19)

Proceedings of the International Display Workshops Volume 26 (IDW '19)

Nov 27, 2019 - Nov 29, 2019
Sapporo Convention Center

2:25 PM - 2:40 PM

[AMD7-4L] Low-Temperature IGZO Technology on Transparent Plastic Foil by Atmospheric Spatial Atomic Layer Deposition

Corné Frijters1,2, Roy Verbeek1, Gerard de Haas1, Tung Huei Ke3, Erwin Vandenplas3, Marc Ameys3, Jan-Laurens van der Steen1, Gerwin Gelinck1,4, Eric Meulenkamp1, Paul Poodt1,2, Auke Kronemeijer1, *Ilias Katsouras1 (1. TNO/Centre (Netherlands), 2. SALDtech B.V. (Netherlands), 3. imec (Belgium), 4. Eindhoven University of Technology (Netherlands))

spatial atomic layer depositionIGZO, display, thin-film transistors, large-area processing

https://doi.org/10.36463/idw.2019.0489

We use sALD to deposit IGZO and Al2O3 layers in top-gated self-aligned TFTs, achieving a low-temperature process flow (≦200oC). We attain mobility of 8 cm2/Vs and switch-on voltage of -0.1 V for transistors with channel lengths down to 1 μm, enabling a 200 ppi QVGA display on transparent PEN foil.