International Display Workshops General Incorporated Association

Proceedings of the International Display Workshops Volume 26 (IDW '19)

Proceedings of the International Display Workshops Volume 26 (IDW '19)

2019年11月27日 〜 2019年11月29日
Sapporo Convention Center

10:40 〜 13:10

[FMCp3-9] Reduction of Oxide Defects in ZrO2/Al2O3/ZrO2 Dielectrics by Incorporating Hydrogen Peroxide

*Gaeun Lee1, Byoungdeog Choi1 (1. Sungkyunkwan University (Korea))

high-k, ZrO2, Al2O3, Hydrogen peroxide, solution process

https://doi.org/10.36463/idw.2019.0724

Capacitance- and current-voltage characteristics of ZrO2/Al2O3/ZrO2 (ZAZ) capacitors with an addition of hydrogen peroxide (H2O2) were identified. From the results, leakage current and interface trap density of the H2O2-doped devices decreased due to reduction of oxygen vacancies in ZAZ layers. H2O2 effect on the electrical behaviors was qualitatively analyzed.