[AMDp1-5] Selective Doping in Drain Region of Amorphous Oxide Thin-Film Transistor by Electrical Stress under Illumination

*Himchan Oh¹、Chi-Sun Hwang¹ (1.Electronics and Telecommunications Research Institute (Korea))

Proceedings of the International Display Workshops Volume 28 (IDW '21) |PDF ダウンロード

[AMDp1-6] A Novel LTPS Pixel Circuit to Achieve High Uniformity at Low Gary Scale

*Huiling Lu¹、Yahui Hou²、Lu Zhang²、Siwei Xu²、Siming Hu² (1.Kunshan New Flat Panel Display Technology Center Co. (China)、2.Kunshan Govisionox Optoelectronics Co. (China))

Proceedings of the International Display Workshops Volume 28 (IDW '21) |PDF ダウンロード

[AMDp1-6] A Novel LTPS Pixel Circuit to Achieve High Uniformity at Low Gary Scale

*Huiling Lu¹、Yahui Hou²、Lu Zhang²、Siwei Xu²、Siming Hu² (1.Kunshan New Flat Panel Display Technology Center Co. (China)、2.Kunshan Govisionox Optoelectronics Co. (China))

Proceedings of the International Display Workshops Volume 28 (IDW '21) |PDF ダウンロード

[AMDp1-7] Hydrogenated Amorphous Silicon Film Transistor Fabrication with Back-Channel-Oxidized Method

*Meng Chen¹、Zhengxin Xu²、Zhixiong Jiang¹、Shiyu Dong¹、Hantao Yang¹、Lingzhi Wu²、Houkuan Sun²、Lei Guo²、Wufeng Ren²、Wu Cao¹、Hongyuan Xu¹、Jun Seo² (1.TCL China Star Optoelectronics Technology Co., Ltd (China)、2.Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd (China))

Proceedings of the International Display Workshops Volume 28 (IDW '21) |PDF ダウンロード

[AMDp1-8L] Investigation of NBIS Degradation Mechanism in Oxide TFT Assisted by Charge Trap Phenomena

*Shunsuke Omae¹、Takanori Takahashi¹、Mutshunori Uenuma¹、Yukiharu Uraoka¹ (1.Nara Institute of Science and Technology (Japan))

Proceedings of the International Display Workshops Volume 28 (IDW '21) |PDF ダウンロード

[FMC2-1(Invited)] Development of 3,000 ppi RGB Direct Patterning OLED Micro-Display

*Chiwoo Kim¹、Jae Hoon Jung¹、Dong Young Sung¹、TaeKyung Kim²、Jong Kap Park¹、Doh Hoon Kim¹、Kiro Jung¹ (1.APS Research (Korea)、2.Hongik University (Korea))

Proceedings of the International Display Workshops Volume 28 (IDW '21) |2021年12月2日(木) 15:20 〜 15:40 |PDF ダウンロード

[FMC2-2(Invited)] Feasibility of Low-Cost Micro-LED Manufacturing with Sputtering

*Hiroshi Fujioka¹、Kohei Ueno¹、Atsushi Kobayashi¹ (1.The University of Tokyo (Japan))

Proceedings of the International Display Workshops Volume 28 (IDW '21) |2021年12月2日(木) 15:40 〜 16:00 |PDF ダウンロード

[FMC2-3] Micro-LED Mass Transfer - A Future Proof UV Laser Based Process

*Oliver Haupt Haupt¹、Jan Brune¹ (1.Coherent LaserSystems GmbH & Co. KG (Germany))

Proceedings of the International Display Workshops Volume 28 (IDW '21) |PDF ダウンロード

[FMC2-3] Micro-LED Mass Transfer - A Future Proof UV Laser Based Process

*Oliver Haupt Haupt¹、Jan Brune¹ (1.Coherent LaserSystems GmbH & Co. KG (Germany))

Proceedings of the International Display Workshops Volume 28 (IDW '21) |2021年12月2日(木) 16:00 〜 16:20 |PDF ダウンロード

[FMC2-4L] Array of GaN Micro-LED Chips and Monocrystal Si CMOS Pixel Circuit Chips Mounted on Flexible Substrate

*Tetsuya Goto¹、Takeshi Okuno²、Yoshikazu Suzuki²、Koichi Kajiyama²、Yoshihiko Muramoto³、Shigetoshi Sugawa¹ (1.Tohoku University (Japan)、2.V-Technology Co., Ltd. (Japan)、3.Nitride Semiconductors Co., Ltd. (Japan))

Proceedings of the International Display Workshops Volume 28 (IDW '21) |PDF ダウンロード