International Display Workshops General Incorporated Association

10:00 〜 10:20

[AMD5-4L (Invited)] 1.5-inch, 3207-ppi OLED Display Enabled by Monolithic Integration of OSFETs and Si CMOS

*Minato Ito1、Munehiro Kozuma1、Toshihiko Saito1、Hidetomo Kobayashi1、Ryota Hodo1、Tsutomu Murakawa1、Hitoshi Kunitake1、Tomoya Aoyama1、Shih-Ci Yen2、Chuan-Hua Chang2、Wen-Hsiang Hsieh2、Hiroshi Yoshida2、Min-Cheng Chen2、Ming-Han Liao3、Shou-Zen Chang2、Shunpei Yamazaki1 (1.Semiconductor Energy Laboratory Co. Ltd. (Japan)、2.Powerchip Semiconductor Manufacturing Corporation (Taiwan)、3.National Taiwan University (Taiwan))

OSFET, OLED, Ultra high definition

https://doi.org/10.36463/idw.2022.0172

Oxide semiconductor field-effect transistors (OSFETs) can be stacked over silicon (Si) field-effect transistors (FETs). We used this technology to form Si–oxide semiconductor composite LSI and prototyped an OLED display in which Si FETs and OSFETs are monolithically stacked. This stacking enabled a larger screen and a lower power driver.