3:30 PM - 3:50 PM
[FLX2-3 (Invited)] High Performance Solution Processed Oxide Semiconductors and Hybrid Materials for Flexible Electronics
Low Temperature Process, hybrid materials, fully solution processed TFTs
Development of solution-processed channel and gate insulators is essential for large area flexible electronics. Here, we demonstrate how hybrid siloxane materials and oxide semiconductors are used in high performance fully solution-processed TFTs with mobilities >30 cm2/Vs. Our low temperature approach enables fabrication of fully solution-processed TFTs on flexible substrates.