[A-2-1] Semi-Insulating Polycrystalline-Silicon (SIPOS) Passivation Technology T. Matsushita、T. Aoki、T. Otsu、H. Yamoto、H. Hayashi、M. Okayama、Y. Kawana (1.SONY Corporation, Atsugi Plant) https://doi.org/10.7567/SSDM.1975.A-2-1