[A-3-2] Micro-probe Auger Analysis of Si Migration in Al Metallization for LSI T. Inoue, S. Horiuchi, H. Shimizu, T. Ishida (1.Toshiba R & D Center, Electrotechnical Lab. Nippon Electric Varian Co.) https://doi.org/10.7567/SSDM.1975.A-3-2