[A-3-3] Fully Ion Implanted DSA MOS IC

I. Ohkura, M. Ohmori, K. Shimotori, T. Nakano, Y. Hayashi, Y. Tarui (1.Mitsubishi Electric Corporation, 2.Electrotechnical Laboratory)

https://doi.org/10.7567/SSDM.1976.A-3-3