[B-6-3] Quantitative In-depth Profile of Passivated Oxide Layers of GaAs by AES-SIMS - a Comparison of Thermal, Anodic and Plasma Oxidation
K. Watanabe, M. Hashiba, T. Yamashina
(1.Department of Nuclear Engineering, Faculty of Engineering, Hokkaido University)
https://doi.org/10.7567/SSDM.1977.B-6-3