[A-6-4] MOS LSI Fabrication Process Using Direct Electron Beam Writing Y. Sakakibara、E. Arai、H. Yoshino、T. Kobayashi、H. Akiya、K. Hirata (1.Musashino Electrical Communication Laboratory, NTT) https://doi.org/10.7567/SSDM.1978.A-6-4