[A-3-3] Short Channel MOS FET's Fabricated by Self-Aligned Ion Implantation and Laser Annealing

M. Miyao, M. Koyanagi, H. Tamura, N. Hashimoto, T. Tokuyama (1.Central Research Laboratory, 2.Hitachi Ltd.)

https://doi.org/10.7567/SSDM.1979.A-3-3