[A-3-3] Short Channel MOS FET's Fabricated by Self-Aligned Ion Implantation and Laser Annealing

M. Miyao、M. Koyanagi、H. Tamura、N. Hashimoto、T. Tokuyama (1.Central Research Laboratory、2.Hitachi Ltd.)

https://doi.org/10.7567/SSDM.1979.A-3-3