[A-3-4] Resistivity Reduction of Polycrystalline Silicon Films by Laser Annealing

Susumu KOHYAMA、Shinji ONGA、Kenji SHIBATA、Hisakazu IIZUKA (1.Semiconductor Device Engineering Lab. Toshiba Corporation)

https://doi.org/10.7567/SSDM.1979.A-3-4