[A-4-3] Custom LSI Process with a Micron Geometry, Partially Using Electron Beam Direct Writing

N. Endo, Y. Kurogi, K. Suzuki, M. Sugimoto, M. Morimoto, Y. Iida, K. Mori (1.Central Research Laboratories, Nippon Electric Co., Ltd.)

https://doi.org/10.7567/SSDM.1980.A-4-3