[A-4-3] Custom LSI Process with a Micron Geometry, Partially Using Electron Beam Direct Writing

N. Endo、Y. Kurogi、K. Suzuki、M. Sugimoto、M. Morimoto、Y. Iida、K. Mori (1.Central Research Laboratories, Nippon Electric Co., Ltd.)

https://doi.org/10.7567/SSDM.1980.A-4-3