[A-4-2] Recrystallization of Silicon Film on Nitride/Oxide double Insulating Structure by CW Laser Irradiation

T. Nishimura、H. Sakurai、S. Nagao、T. Isu、Y. Akasaka、N. Tsubouchi (1.LSI Development Laboratory, Mitsubishi Electric Corporation、2.Central Research Laboratory, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1981.A-4-2