[A-4-2] Recrystallization of Silicon Film on Nitride/Oxide double Insulating Structure by CW Laser Irradiation

T. Nishimura, H. Sakurai, S. Nagao, T. Isu, Y. Akasaka, N. Tsubouchi (1.LSI Development Laboratory, Mitsubishi Electric Corporation, 2.Central Research Laboratory, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1981.A-4-2