[A-5-8] High Voltage Electron Beam Writing for Submicron Design Rule VLSI Fabrications M. Yoshimi、M. Takahashi、K. Kawabuchi、Y. Kato、T. Takigawa (1.Toshiba Research and Development Center, Toshiba Corporation) https://doi.org/10.7567/SSDM.1982.A-5-8