[A-5-8] High Voltage Electron Beam Writing for Submicron Design Rule VLSI Fabrications

M. Yoshimi, M. Takahashi, K. Kawabuchi, Y. Kato, T. Takigawa (1.Toshiba Research and Development Center, Toshiba Corporation)

https://doi.org/10.7567/SSDM.1982.A-5-8