Evaluation and Control of Grain Boundaries in Laser-Recrystallized Polysilicon Island for Device Fabrication

T. Nishimura; A. Ishizu; Y. Akasaka

doi:https://doi.org/10.7567/SSDM.1982.A-6-8

[A-6-8] Evaluation and Control of Grain Boundaries in Laser-Recrystallized Polysilicon Island for Device Fabrication

T. Nishimura、A. Ishizu、Y. Akasaka (1.LSI Research and Development Laboratory, Mitsubishi Electric Corporation、2.Materials Research Laboratory, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1982.A-6-8

1982 International Conference on Solid State Devices

[A-6-8] Evaluation and Control of Grain Boundaries in Laser-Recrystallized Polysilicon Island for Device Fabrication