[A-7-4] The Impact of Drain Impurity Profile and Junction Depth on Submicron MOSFETs

Eiji TAKEDA, Tohhachi MAKINO, Takaaki HAGIWARA (1.Central Research Laboratory, Hitachi Ltd., 2.Hitachi Microcomputer Engineering, Ltd.)

https://doi.org/10.7567/SSDM.1983.A-7-4