[B-10-2] Low Temperature Fabrication of SOI-MOSFET's in Si/CaF2/Si Heteroepitaxial Structures

Tanemasa Asano, Shinichi Wakabayashi, Hiroshi Ishiwara (1.Graduate School of Science and Engineering, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.1984.B-10-2