[B-12-5] High Transconductance Si-TFT's Using Ta2O5 Films as Gate Insulators

Shunji Seki、Takashi Unagami、Bunjiro Tsujiyama (1.Ibaraki Electrical Communication Laboratory Nippon Telegraph and Telephone Public Corporation)

https://doi.org/10.7567/SSDM.1984.B-12-5