SOI / CMOS Gate Array by Laser Recrystallization

Tetsuo Izawa; Seiichiro Kawamura; Nobuo Sasaki; Motoo Nakano; Kunihiko Wada; Mitsumasa Ashida

doi:https://doi.org/10.7567/SSDM.1984.LC-12-5

1984 International Conference on Solid State Devices and Materials

Aug 30, 1984 - Sep 1, 1984
International Conference Center Kobe, Kobe, Japan

[LC-12-5] SOI / CMOS Gate Array by Laser Recrystallization

Tetsuo Izawa, Seiichiro Kawamura, Nobuo Sasaki, Motoo Nakano, Kunihiko Wada, Mitsumasa Ashida (1.IC Development Division and MOS Device Development Division Fujitsu Limited)

https://doi.org/10.7567/SSDM.1984.LC-12-5

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