SOI / CMOS Gate Array by Laser Recrystallization

Tetsuo Izawa; Seiichiro Kawamura; Nobuo Sasaki; Motoo Nakano; Kunihiko Wada; Mitsumasa Ashida

doi:https://doi.org/10.7567/SSDM.1984.LC-12-5

1984 International Conference on Solid State Devices and Materials

1984年8月30日〜 1984年9月1日
International Conference Center Kobe, Kobe, Japan

[LC-12-5] SOI / CMOS Gate Array by Laser Recrystallization

Tetsuo Izawa、Seiichiro Kawamura、Nobuo Sasaki、Motoo Nakano、Kunihiko Wada、Mitsumasa Ashida (1.IC Development Division and MOS Device Development Division Fujitsu Limited)

https://doi.org/10.7567/SSDM.1984.LC-12-5

▲