[A-3-5] Low Temperature Low Pressure Silicon Epitaxial Growth and Its Application to Advanced Dielectric Isolation Technology

John O. Borland、Dennis N. Schmidt、Alan R. Stivers (1.Epi Applications Laboratory Applied Materials, Inc.、2.Silicon Device Development Westinghouse R&D Center、3.Technology Development Intel Corporation)

https://doi.org/10.7567/SSDM.1986.A-3-5