[B-1-2] Advanced OSELO Isolation with Shallow Grooves for Three-quarter Micron ULSIs

Toru KAGA, Yoshifumi KAWAMOTO, Shin-pei IIJIMA, Yoshimi SUDOH, Yoshio SAKAI (1.CENTRAL RESEARCH LABORATORY, HITACHI Ltd.)

https://doi.org/10.7567/SSDM.1986.B-1-2