An EPROM Cell Structure for EPLDs Compatible with Single Poly Gate Process

Kuniyoshi YOSHIKAWA; Seiichi MORI; Norihisa ARAI

doi:https://doi.org/10.7567/SSDM.1986.B-7-4

1986 International Conference on Solid State Devices and Materials

1986年8月20日〜 1986年8月22日
Tokyo Prince Hotel, Tokyo, Japan

[B-7-4] An EPROM Cell Structure for EPLDs Compatible with Single Poly Gate Process

Kuniyoshi YOSHIKAWA、Seiichi MORI、Norihisa ARAI (1.Semiconductor Device Engineering Laboratory, Toshiba Corporation、2.Toshiba Microcomputor Engineering Corporation)

https://doi.org/10.7567/SSDM.1986.B-7-4

▲