[C-8-3] Arsenic Diffusion from Solid Source and Its Application to Trench Capacitor

Tetsuo BIWA、Hisakazu MIYATAKE、Yoshihisa NOGAMI、Hiroaki SHIMIZU (1.VLSI Development Laboratories, IC Group, Sharp Corporation)

https://doi.org/10.7567/SSDM.1987.C-8-3