The Japan Society of Applied Physics

[A-3-2] Very-Low-Temperature Epitaxial Silicon Growth by Low-Kinetic-Energy Particle Bombardment

Tadahiro Ohmi、Kiyohiko Matsudo、Tadashi Shibata Takeshi Ichikawa、Hiroshi Iwabuchi (1.Department of Electronics, Faculty of Engineering Tohoku University)

https://doi.org/10.7567/SSDM.1988.A-3-2