[A-3-3] Low Temperature CVD Technique for Crystalline Si Deposition

T. Fujii, H. Araki, M. Ohkuni, Y. Tarui (1.Department of Electronic Engineering, Tokyo University of Agriculture & Technology, 2.VLSI Development Laboratories, Sharp Corporation)

https://doi.org/10.7567/SSDM.1988.A-3-3