[A-4-2] Effects of Magnetic Fields and Excited Plasma Species on Silicon Oxide Film Formation by Microwave Plasma CVD

Takuya Fukuda、Kazuo Suzuki、Yasuhiro Mochizuki、Michio Ohue、Naohiro Momma、Tadashi Sonobe (1.Hitachi Research Laboratory and Hitachi Works, Hitachi Ltd.)

https://doi.org/10.7567/SSDM.1988.A-4-2