[A-4-3] Growth of SiO2 Thin Film by Photo-CVD Using 123nm VUV Light

Kohji INOUE, Masanori OKUYAMA, Yoshihiro HAMAKAWA (1.Department of Electrical Engineering, Faculty of Engineering Science, Osaka University)

https://doi.org/10.7567/SSDM.1988.A-4-3