[A-7-4] Impurity Doping into Single and Poly Crystalline Silicon by a Large Area Ion Doping Technique

Akihisa YOSHIDA、Masatoshi KITAGAWA、Kentaro SETSUNE、Takashi HIRAO (1.Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.)

https://doi.org/10.7567/SSDM.1988.A-7-4