Recrystallization Mechanism for Solid Phase Growth of Poly-Si Films on Quartz Substrates

Akira NAKAMURA; Fumiaki EMOTO; Eiji FUJII; Yasuhiro UEMOTO Atsuya YAMAMOTO; Kohji SENDA; Gota KANO

doi:https://doi.org/10.7567/SSDM.1988.C-1-4

1988 International Conference on Solid State Devices and Materials

1988年8月24日〜 1988年8月26日
Keio Plaza Hotel, Tokyo, Japan

[C-1-4] Recrystallization Mechanism for Solid Phase Growth of Poly-Si Films on Quartz Substrates

Akira NAKAMURA、Fumiaki EMOTO、Eiji FUJII、Yasuhiro UEMOTO Atsuya YAMAMOTO、Kohji SENDA、Gota KANO (1.Electronics Research Laboratory Matsushita Electronics Corporation)

https://doi.org/10.7567/SSDM.1988.C-1-4

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