[C-2-3] Defect Generation at SiO2/Si(100) Interfaces by Metal Contamination

M. Liehr, H. Dallaporta, J. E. Lewis, G. B. Bronner, G. W. Rubloff (1.IBM T. J. Watson Research Center)

https://doi.org/10.7567/SSDM.1988.C-2-3