[C-2-4] Characterization of Very Thin Thermally Nitrided-SiO2/Si Interface Properties with Conductance and Hot Electron Injection Measurement

Z. H. Liu、Y. C. Cheng、H. Wong (1.Department of Electrical and Electronic Engineering University of Hong Kong)

https://doi.org/10.7567/SSDM.1988.C-2-4