[D-2-1] Effect of Bias Sputtering on W and W-Al Schottky Contact Formation and Its Application to GaAs MESFETs

Y. Sekino、T. Kimura、K. Inokuchi、Y. Sano、M. Sakuta (1.R&D Group, Oki Electric Industry Co., Ltd.)

https://doi.org/10.7567/SSDM.1988.D-2-1