[D-2-5] Growth Mechanism of SOI-GaAs Films on CaF2/Si Structures in the Electron-Beam Exposure and Epitaxy (EBE-Epitaxy) Technique

Hee Chul LEE、Tanemasa ASANO、Hiroshi ISHIWARA、Seijiro FURUKAWA (1.Graduate School of Science and Engineering, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.1988.D-2-5