The Japan Society of Applied Physics

[LB-2-2] Formation of Stable Y-Ba-Cu-O Films on Si Substrates via Intermediate Al Layer

T. Asano, K. Tran, M. M. Rahman, T. Y. Yau, A. Byrne, C. Y. Yang, J. D. Reardon (1.Dept. of EECS, Santa Clara Univ., 2.Perkin-Elmer METCO)

https://doi.org/10.7567/SSDM.1988.LB-2-2