[LC-5-2] Low Interface State Density SiO2 on InP by Indirect Plasma CVD with Phosphorous Stabilization

Takashi Fuyuki、Kenji Nishimoto、Tohru Saitoh、Hiroyuki Matsunami (1.Department of Electrical Engineering, Kyoto University)

https://doi.org/10.7567/SSDM.1988.LC-5-2