[S-II-4] In-situ XPS Characterization of Amorphous Semiconductor Hetero-junction Prepared by Photo and Plasma CVD Method

M. Kawasaki, Y. Matsuzaki, T. Ohtaki, Y. Yoshida, H. Koinuma (1.Department of Industrial Chemistry, University of Tokyo, 2.Department of Applied Chemistry, University of Toyo, 3.Research Laboratory of Engineering Materials, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.1988.S-II-4