[A-4-3] Silicon Nitride Films with Low Hydrogen Content, Low Stress, Low Damage and Stoichiometric Composition by Photo-Assisted Plasma CVD

Nobumasa SUZUKI、Toshiaki YOSHIKAWA、Kazuya MASU、Kazuo TSUBOUCHI、Nobuo MIKOSHIBA (1.Production Engineering Research Laboratory, Canon Inc.、2.Research Institute of Electrical Communication, Tohoku University)

https://doi.org/10.7567/SSDM.1989.A-4-3