[A-4-3] Silicon Nitride Films with Low Hydrogen Content, Low Stress, Low Damage and Stoichiometric Composition by Photo-Assisted Plasma CVD

Nobumasa SUZUKI, Toshiaki YOSHIKAWA, Kazuya MASU, Kazuo TSUBOUCHI, Nobuo MIKOSHIBA (1.Production Engineering Research Laboratory, Canon Inc., 2.Research Institute of Electrical Communication, Tohoku University)

https://doi.org/10.7567/SSDM.1989.A-4-3