[A-5-2] A New Dielectric Isolation Technology Using Molten Silicon Spin Deposition

S. Itoh, S. Tanabe, T. Usui, K. Akahane, E. Fujya, Y. Tahara, Y. Maeda (1.Electronic Devices Group, Oki Electric Industry Co., Ltd., 2.Hoxan Research Laboratories, Hoxan Corporation)

https://doi.org/10.7567/SSDM.1989.A-5-2