[A-5-2] A New Dielectric Isolation Technology Using Molten Silicon Spin Deposition

S. Itoh、S. Tanabe、T. Usui、K. Akahane、E. Fujya、Y. Tahara、Y. Maeda (1.Electronic Devices Group, Oki Electric Industry Co., Ltd.、2.Hoxan Research Laboratories, Hoxan Corporation)

https://doi.org/10.7567/SSDM.1989.A-5-2